Nanostructuring of ITO thin films through femtosecond laser ablation

Due to reduced thermal effects, tightly focused femtosecond laser beams can yield submicron resolution with minimal side effects. In laser direct writing applications, diffraction-free nature of the Bessel beams relaxes alignment of the sample and shortens the production time. Micron-sized central spots and long depth of focused beams can be simultaneously produced. We apply fs Bessel beam single-pulse ablation method to transparent conductive oxide films. We use laser of 1030 nm wavelength and two different axicons (base angles are 25 degrees and 40 degrees). Fabricated structures are characterized by optical microscope, atomic force microscope and scanning electron microscope. Laser beam shaping and virtues of non-diffracted Bessel beams provide periodic structures for scribing in the solar cells or high-resolution displays and reduce the process time.