COMPARISON OF THE AS DEPOSITED NICR2O4: ZNO AND NIO:ZNO THIN FILMS TOGETHER WITH DEVICES GROWN BY RADIO FREQUENCY SPUTTERING TECHNIQUE
Özet
In this study, as-deposited and ZnO doped NiCr2O4, NiO thin films were grown under 30% oxygen partial pressure by Radio Frequency Magnetron Sputtering (RFMS) technique. The structural, optical and morphological properties of as-deposited and Zn dopped NiCr2O4, NiO films were investigated. X-Ray Diffraction (XRD) measurements has shown that doping with Zn changes the diffraction peak position. Again, Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM) measurements has shown a significant change of the surface morphologies by the Zn doping. Gas sensor properties of the films in the relatively high temperature (200-300 0C) were performed and comparison has been made by the device performances of the two different kind of films.
Atıf için künye
Turgut, E., GÜR, E., Yıldırım, M., & Sarıtaş, S. (2019). COMPARISON OF THE AS DEPOSITED NICR2O4: ZNO AND NIO:ZNO THIN FILMS TOGETHER WITH DEVICES GROWN BY RADIO FREQUENCY SPUTTERING TECHNIQUE. MARDİN ARTUKLU INTERNATIONAL SCIENTIFIC RESEARCH CONGRESS, Mardin (ss. 324–330).
BibTeX
@inproceedings{turgut2019-64041,
author = {Turgut, Erdal and GÜR, Emre and Yıldırım, Muhammet and Sarıtaş, Sevda},
title = {COMPARISON OF THE AS DEPOSITED NICR2O4: ZNO AND NIO:ZNO THIN FILMS TOGETHER WITH DEVICES GROWN BY RADIO FREQUENCY SPUTTERING TECHNIQUE},
booktitle = {MARDİN ARTUKLU INTERNATIONAL SCIENTIFIC RESEARCH CONGRESS},
address = {Mardin},
year = {2019},
pages = {324--330},
url = {https://akademik.atauni.edu.tr/yayinlar/64041-comparison-of-the-as-deposited-nicr2o4-zno-and-niozno-thin-films-together-with}
}