Bildiri
Uluslararası
2015
FABRICATION AND CHARACTERIZATION OF SILICON NITRIDE Si3N4 THIN FILMS BY PLASMA ENHANCEMENT CHEMICAL VAPOR DEPOSITION PECVD
World Conference on Technology, Innovation and Entrepreneurship
28.05.2015–30.05.2015 · 28.05.2015
Atıf için künye
Odabaş, E., Aras, G., ORHAN, E., & Boydaş, E. (2015). FABRICATION AND CHARACTERIZATION OF SILICON NITRIDE Si3N4 THIN FILMS BY PLASMA ENHANCEMENT CHEMICAL VAPOR DEPOSITION PECVD. World Conference on Technology, Innovation and Entrepreneurship.
BibTeX
@inproceedings{odabas2015-63084,
author = {Odabaş, Emre and Aras, Gonca and ORHAN, ELİF and Boydaş, Elif},
title = {FABRICATION AND CHARACTERIZATION OF SILICON NITRIDE Si3N4 THIN FILMS BY PLASMA ENHANCEMENT CHEMICAL VAPOR DEPOSITION PECVD},
booktitle = {World Conference on Technology, Innovation and Entrepreneurship},
year = {2015},
url = {https://akademik.atauni.edu.tr/yayinlar/63084-fabrication-and-characterization-of-silicon-nitride-si3n4-thin-films-by-plasma}
}