Bildiri
Tam Metin Bildiri
Uluslararası
2014
The Effect of Pulse and Bias DC Voltage on Crystallization of TiNi Shape Memory Thin Films Deposited by Unbalanced Magnetron Sputtering
ICMCTF14, 41th Int. Conf. on Metallurgical Coatings and Thin Films
San Diago · 28.04.2014–02.05.2014 · 28.04.2014
Atıf için künye
Çiçek, H., EFEOĞLU, İ., Baran, Ö., & Totik, Y. (2014). The Effect of Pulse and Bias DC Voltage on Crystallization of TiNi Shape Memory Thin Films Deposited by Unbalanced Magnetron Sputtering. ICMCTF14, 41th Int. Conf. on Metallurgical Coatings and Thin Films, San Diago.
BibTeX
@inproceedings{cicek2014-190870,
author = {Çiçek, Hikmet and EFEOĞLU, İhsan and Baran, Özlem and Totik, Yaşar},
title = {The Effect of Pulse and Bias DC Voltage on Crystallization of TiNi Shape Memory Thin Films Deposited by Unbalanced Magnetron Sputtering},
booktitle = {ICMCTF14, 41th Int. Conf. on Metallurgical Coatings and Thin Films},
address = {San Diago},
year = {2014},
url = {https://akademik.atauni.edu.tr/yayinlar/190870-the-effect-of-pulse-and-bias-dc-voltage-on-crystallization-of-tini-shape-memory}
}