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Makale Derleme Uluslararası 2012

Comparison of structure and tribological properties of MoS2-Ti films deposited by biased-dc and pulsed-dc

Ersin ARSLAN, Yaşar Totik, İhsan EFEOĞLU

PROGRESS IN ORGANIC COATINGS Cilt 74 · Sayı 4 · ss. 772–776 · 01.08.2012
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Özet

A closed field unbalanced magnetron sputter (Teer-CFUBMS/550) system was used for the deposition of MoS2-Ti composite coatings on steel substrate (AISI D2) using biased-dc and pulsed-dc. The tribological properties of MoS2-Ti coatings were characterized by pin-on-disc wear tester under atmospheric conditions. Structural analysis was pointed out using X-ray diffraction and SEM-EDS. The microstructure and chemical composition of MoS2-Ti films are very strongly influenced by the sputtering process conditions. While X-ray diffraction pattern of films deposited using pulsed-dc shows mainly (0 0 2) reflections, the films deposited by dc-bias exhibit random orientation being both (0 0 2) and (1 0 0) reflections. Tribological performance of the films deposited using both techniques were compared in view of both crystallographic orientation and Ti content. (C) 2011 Elsevier B.V. All rights reserved.

Anahtar kelimeler

WEAR Magnetron sputtering COATINGS MOS2 WEAR PROPERTIES VOLTAGE Friction Pulsed -Dc Biased-dc LUBRICATION

Atıf için künye

ARSLAN, E., Totik, Y., & EFEOĞLU, İ. (2012). Comparison of structure and tribological properties of MoS2-Ti films deposited by biased-dc and pulsed-dc. PROGRESS IN ORGANIC COATINGS, 74(4), 772–776. https://doi.org/10.1016/j.porgcoat.2011.10.021

BibTeX
@article{arslan2012-190809,
  author = {ARSLAN, Ersin and Totik, Yaşar and EFEOĞLU, İhsan},
  title = {Comparison of structure and tribological properties of MoS2-Ti films deposited by biased-dc and pulsed-dc},
  journal = {PROGRESS IN ORGANIC COATINGS},
  year = {2012},
  volume = {74},
  number = {4},
  pages = {772--776},
  issn = {0300-9440},
  doi = {10.1016/j.porgcoat.2011.10.021},
  url = {https://akademik.atauni.edu.tr/yayinlar/190809-comparison-of-structure-and-tribological-properties-of-mos2-ti-films-deposited}
}