Deposition and Adhesion Characterization of Ti(BN:MoS2) Based Composite Thin Films Prepared by Closed-Field Unbalanced Magnetron Sputtering
Özet
Composite structured solid thin films were deposited on 52100 tool steel by co-sputtering from BN, TiB2, MoS2 and Ti targets using a closed-field unbalanced magnetron sputtering process (CFUBMS). The structural and mechanical properties of the composite structured coatings were investigated. The composition and morphology of the films were investigated using X-ray diffraction and scanning electron microscopy (SEM). The adhesion properties of the films were characterized by the use of a Revetest-scratch tester. The adhesion test results indicated that bias voltage was the most effective coating parameter related to the critical load. (C) Koninklijke Brill NV, Leiden, 2011
Anahtar kelimeler
Atıf için künye
YETIM, A. F., EFEOĞLU, İ., Çelik, A., Alsaran, A., & Kaymaz, I. (2011). Deposition and Adhesion Characterization of Ti(BN:MoS2) Based Composite Thin Films Prepared by Closed-Field Unbalanced Magnetron Sputtering. Journal of Adhesion Science and Technology, 25(13), 1497–1505. https://doi.org/10.1163/016942410x549933
BibTeX
@article{yetim2011-190421,
author = {YETIM, Ali Fatih and EFEOĞLU, İhsan and Çelik, Ayhan and Alsaran, Akgün and Kaymaz, Irfan},
title = {Deposition and Adhesion Characterization of Ti(BN:MoS2) Based Composite Thin Films Prepared by Closed-Field Unbalanced Magnetron Sputtering},
journal = {Journal of Adhesion Science and Technology},
year = {2011},
volume = {25},
number = {13},
pages = {1497--1505},
issn = {0169-4243},
doi = {10.1163/016942410x549933},
url = {https://akademik.atauni.edu.tr/yayinlar/190421-deposition-and-adhesion-characterization-of-tibnmos2-based-composite-thin-films}
}