A simple method producing shadow masks used in electrical characterization techniques
Özet
In this paper, a novel technique is introduced to make a shadow mask (SM) that is used in various electrical characterization techniques such as Hall-resistivity, magnetoresistance, and TLM (Transmission Line Method) ohmic contact measurements. By using this technology, a film thickness of about 0.25-0.30 mum was obtained after photoprocessing. We reached an SM thickness of 15-20 mum by electrodeposition, which is required for a sufficiently high toughness. It was observed that the sharpness of the masks was also fairly good. The SMs obtained using this technology have been successfully used in various applications.
Atıf için künye
COŞKUN, C., & Efeoğlu, H. (2003). A simple method producing shadow masks used in electrical characterization techniques. INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, 46(3), 410–412. https://doi.org/10.1023/a%3A1024443228073
BibTeX
@article{coskun2003-180878,
author = {COŞKUN, CEVDET and Efeoğlu, Hasan},
title = {A simple method producing shadow masks used in electrical characterization techniques},
journal = {INSTRUMENTS AND EXPERIMENTAL TECHNIQUES},
year = {2003},
volume = {46},
number = {3},
pages = {410--412},
issn = {0020-4412},
doi = {10.1023/a:1024443228073},
url = {https://akademik.atauni.edu.tr/yayinlar/180878-a-simple-method-producing-shadow-masks-used-in-electrical-characterization}
}