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Bildiri Davetli Konuşmacı Uluslararası 2018

Growth Rate Enhancement of TiO2 byR-HiPIMS and Application to MemristorFabrication

BANAFSHEH ALIZADEH ARASHLOO, Hasan Efeoğlu, Tevhit Karacalı

INTERNATIONAL SYMPOSIUM ON APPLIEDSCIENCES AND ENGINEERING ss. 4–6 · Erzurum · 26.11.2018–28.11.2018 · 26.11.2018

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ARASHLOO, B. A., Efeoğlu, H., & Karacalı, T. (2018). Growth Rate Enhancement of TiO2 byR-HiPIMS and Application to MemristorFabrication. INTERNATIONAL SYMPOSIUM ON APPLIEDSCIENCES AND ENGINEERING, Erzurum (ss. 4–6).

BibTeX 
@inproceedings{arashloo2018-180605,
  author = {ARASHLOO, BANAFSHEH ALIZADEH and Efeoğlu, Hasan and Karacalı, Tevhit},
  title = {Growth Rate Enhancement of TiO2 byR-HiPIMS and Application to MemristorFabrication},
  booktitle = {INTERNATIONAL SYMPOSIUM ON APPLIEDSCIENCES AND ENGINEERING},
  address = {Erzurum},
  year = {2018},
  pages = {4--6},
  url = {https://akademik.atauni.edu.tr/yayinlar/180605-growth-rate-enhancement-of-tio2-byr-hipims-and-application-to}
}