Fabrication of highly reflective gratings in 1.5 μm semiconductor lasers using focused ion beam-based etching

CAKMAK, Bülent; Karacalı, Tevhit; REN, Z.; YU, S.

doi:10.1016/j.mee.2010.04.004

Makale Tam Makale Uluslararası 2010

Fabrication of highly reflective gratings in 1.5 μm semiconductor lasers using focused ion beam-based etching

Bülent CAKMAK, Tevhit Karacalı, Z. REN, S. YU

MICROELECTRONIC ENGINEERING Cilt 87 · Sayı 11 · ss. 2343–2347 · 01.11.2010

DOI ile aç

Atıf için künye

CAKMAK, B., Karacalı, T., REN, Z., & YU, S. (2010). Fabrication of highly reflective gratings in 1.5 μm semiconductor lasers using focused ion beam-based etching. MICROELECTRONIC ENGINEERING, 87(11), 2343–2347. https://doi.org/10.1016/j.mee.2010.04.004

BibTeX

@article{cakmak2010-180567,
  author = {CAKMAK, Bülent and Karacalı, Tevhit and REN, Z. and YU, S.},
  title = {Fabrication of highly reflective gratings in 1.5 μm semiconductor lasers using focused ion beam-based etching},
  journal = {MICROELECTRONIC ENGINEERING},
  year = {2010},
  volume = {87},
  number = {11},
  pages = {2343--2347},
  issn = {0167-9317},
  doi = {10.1016/j.mee.2010.04.004},
  url = {https://akademik.atauni.edu.tr/yayinlar/180567-fabrication-of-highly-reflective-gratings-in-15-mm-semiconductor-lasers-using}
}