language Türkçe
Article 2025 · 0 citations

Numerical simulation of a graphene/n-WS<sub>2</sub>/a-Si:H(I)/p-cSi/Ag HIT solar cell

Karabulut, Nahide, Aydin, Busra, Duman, Caglar

Abstract

In this study, the WS2/a-Si:H/p-cSi heterojunction with intrinsic thin layer (HIT) solar cell structure was designed and simulated using the AFORS-HET software (version 2.5). Tungsten disulfide (WS2) stands out among two-dimensional materials due to its superior electrical and optical properties in photonic device applications. The optical and electronic properties of WS2 change as the thickness varies from bulk to monolayer. In this study, unlike other simulation studies on solar cells based on transition metal dichalcogenides in the literature, variation of the parameters such as the band gap, electron affinity, and refractive index with variation of the number of WS2 layers were taken into account. HIT solar cells are preferred among silicon-based solar cells due to their very high cell efficiencies. For this purpose, amorphous silicon (a-Si) was used as an interlayer. Additionally, graphene was used as the contact material due to its superior properties, and its performance was compared with ITO contacts. By optimizing the thicknesses and carrier concentrations of WS2, p-cSi, and the thickness of a-Si, a very high photovoltaic conversion efficiency of 29.64% was achieved. To the best of our knowledge, there is no study in the existing literature that investigates the integration of a WS2 layer in HIT solar cells. However, the findings of this study demonstrate that both the proposed device architecture and the WS2 material exhibit promising potential for future applications in optoelectronic technologies.

Keywords
AFORS-HET WS2 graphene HIT solar cell simulation power conversion efficiency WORK FUNCTION THIN-FILMS N-TYPE EMISSION STATES
WoS Categories
Materials Science, Multidisciplinary Physics, Applied
Citation
Journal
MODELLING AND SIMULATION IN MATERIALS SCIENCE AND ENGINEERING
Year
2025
Volume
33
Issue
5
ISSN
0965-0393
eISSN
1361-651X
DOI
10.1088/1361-651X/addadd
WoS UID
WOS:001512104900001
Open via DOI