Evaluating STC-1 and STC-2 mRNA expressions in Schizophrenia patients with increased oxidative stress

Introduction. - Schizophrenia is a chronic psychiatric disorder characterized by cognitive impairment. Oxidative stress is associated with disease progression in patients with schizophrenia. Stanniocalcin (STC)-1 and STC-2 are two proteins commonly expressed in mammals belonging to the stanniocalcin family and they are involved in oxidative stress. The aim of this study is to investigate STC-1 and STC-2 mRNA expressions in schizophrenia patients with altered oxidative stress parameters. Methods. - For this purpose, 70 patients with schizophrenia and 40 healthy individuals were recruited for the study. Peripheral blood samples were obtained from all participants. Glutathione (GSH) activities, superoxide dismutase (SOD) activities, and malondialdehyde (MDA) levels were measured. STC-1 and STC-2 expressions were assessed by real-time polymerase chain reactions. Results. - SOD activity levels were lower in patients than in healthy individuals (p = 0.0309), while the patients' MDA levels were higher (p = 0.039). STC-1 and STC-2 expressions were lower in patients than in healthy individuals (p = 0.1049 and p < 0.0001, respectively). Furthermore, these two genes had a positive correlation among the patients (r = 0.435, p = 0.0025). According to area under the curve (AUC) values, STC-2 (AUC = 0.8332, p < 0.0001) had better diagnostic power than STC-1 (AUC = 0.6167, p = 0.1037). Conclusions. - The expression of stanniocalcins in schizophrenia was investigated here for the first time. Decreased STC-2 expression in patients with schizophrenia with increased oxidative stress parameters may guide the understanding of the pathophysiological mechanisms caused by oxidative stress, which may be increased in cognitive diseases such as schizophrenia, and it also has the potential to be a prognostic factor that can be used in the diagnosis of schizophrenia.

Dergi

ANNALES MEDICO-PSYCHOLOGIQUES

Yıl

2024

Cilt

182

Sayı

9

Sayfa

785-790

ISSN

0003-4487

eISSN

1769-6631

DOI

10.1016/j.amp.2023.02.005

WoS UID

WOS:001361396000001