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LASER PHYSICS

2 yayın · 1 atıf

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ICP-RIE etching of InP using CH<sub>4</sub>/H<sub>2</sub>, CH<sub>4</sub>/H<sub>2</sub>/Cl<sub>2,</sub> H<sub>2</sub>/Cl<sub>2</sub> and Cl<sub>2</sub>: process development and optimization
2025 Aksakal, Rukiye, Cakmak, Bulent 0
A comparative investigation of 980 nm GaAs and 1550 nm InP-based diode lasers
2021 Arslan, Kamer Ozge, Aksakal, Rukiye, Cakmak, Bulent 1